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2 February 2012
CIGS PV firm MiaSolé hits 17.3% efficiency with champion module; 14% now in production

Advances in R&D and manufacturing efficacy yield achievements ahead of schedule.

1 February 2012
CPV firm Semprius sets record 33.9% solar module efficiency

Siemens partner to ramp pilot production in second-half 2012.

1 February 2012
Inphi and NeoPhotonics collaborate on 100G optical modules

Firms to accelerate transition to integrated, efficient 100GbE for cloud and data-center applications.

31 January 2012
Latest issue of Semiconductor Today now available

Key coverage of compound and advanced Si semiconductor business and technology.

30 January 2012
Increased mobility and reduced residual electron concentration indium nitride

Boundary-controlled temperature epitaxy gives best figures achieved so far.

30 January 2012
Oclaro’s quarterly revenue down 28% year-on-year

...but recovery from Thailand flooding drives revenue above guidance.

27 January 2012
Year-on-year handset shipment growth of 11% in Q4 takes 2011 to 1.55 billion units

Apple reaches 8% market share in Q4; Samsung’s shipments grow 18% year-on-year as Nokia falls 8%.

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31 January 2012
Doubling breakdown voltage with double heterostructure

AlGaN/GaN/AlGaN HEMT also reduces off-state leakage by factor of 100.

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RSS feeds Features
30 November 2011

Metal-nitride semiconductor avalanche for UV detection
Chinese group produces first MSM APDs on free-standing GaN with 400μm x 400μm effective area.

30 November 2011

Nitrogen/oxygen plasma improves p-type MgZnO for zinc oxide UV LEDs
LEDs produced with 35x the intensity of devices produced with nitrogen-only plasma at 20mA.

30 November 2011

Deep ultraviolet goes deeper on silicon
Epitaxial lateral overgrowth used to improve the quality of aluminum nitride templates for deep UV LEDs.

30 November 2011

Record output for single-chip 262nm mid-UV LED
Crystal IS and US ARL approach power needed for specialized use.

30 November 2011

Wet versus dry etching for sapphire wafers
Imtec Acculine’s Derek Mendes discusses how wet etching of patterned sapphire substrates for GaN LED manufacturing can present cost savings over dry etching.

30 November 2011

Patterned sapphire for nitride enhancements
In the past few years, patterned sapphire substrates have been used to improve performance of nitride semiconductor light-emitting devices.

30 November 2011

First Chinese Ka-band nitride semiconductor MMIC
Researchers look to higher frequency of ~30GHz for microwave device construction.

30 November 2011

Passivated AlInN/GaN HEMT pushes past 200GHz cut-offs
Switzerland-based research characterizes 30nm-gate-length high-electron-mobility transistor with cut-off frequency of 205GHz.

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8 November 2011

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IQE, Bath

 
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CrystAL-N - Substrates for epitaxy