Semiconductor Today: first choice for the compound semiconductor industry

Visit us at Linked In

Media Kit 2012 Download

Full information about advertising options with Semiconductor Today can be found by clicking here, or for easy printing, PDF versions are available using the links below:

Download USD Media Kit PDF (2.4 MB)

Download Euro Media Kit PDF (2.4 MB)

Download £ Sterling Media Kit PDF (2.4 MB)

RSS feeds Headline News
27 January 2012
Year-on-year handset shipment growth of 11% in Q4 takes 2011 to 1.55 billion units

Apple reaches 8% market share in Q4; Samsung’s shipments grow 18% year-on-year as Nokia falls 8%.

25 January 2012
RFMD’s quarterly revenue falls 19% year-on-year to $225.4m

China 2G decline offsets 3G/4G growth outpacing smart-phone market.

25 January 2012
Optical transport system maker Optelian acquires Versawave

Vertical integration supplemented by 100G optical modulator provider.

24 January 2012
AXT to establish second substrate-making facility in China

$12.5m investment in constructing Tianjin plant over next two years.

24 January 2012
AQT readies ‘CIGS 3.0’ CZTS thin-film PV cells for commercialization

Earth-abundant materials promise to reduce cost of thin-film PV cells.

24 January 2012
3S Photonics Group becomes 3SPGroup

3S Photonics, Avensys and Manlight merged into one brand.

News Archive
Financial Tracker
RFIC Makers:
Substrate Makers:
LEDs:
Optical Communications:
Photovoltaics:
Equipment Makers:
All quotes delayed at least 20 mins.

Powered by FinancialContent

RSS feeds News Features
26 January 2012
SiO2/GaN nano-rods give new base for high light output power

Dislocations reduced, light extraction increased.

RSS feeds Other News & Products
News Archive
Advert
RSS feeds Features
30 November 2011

Metal-nitride semiconductor avalanche for UV detection
Chinese group produces first MSM APDs on free-standing GaN with 400μm x 400μm effective area.

30 November 2011

Nitrogen/oxygen plasma improves p-type MgZnO for zinc oxide UV LEDs
LEDs produced with 35x the intensity of devices produced with nitrogen-only plasma at 20mA.

30 November 2011

Deep ultraviolet goes deeper on silicon
Epitaxial lateral overgrowth used to improve the quality of aluminum nitride templates for deep UV LEDs.

30 November 2011

Record output for single-chip 262nm mid-UV LED
Crystal IS and US ARL approach power needed for specialized use.

30 November 2011

Wet versus dry etching for sapphire wafers
Imtec Acculine’s Derek Mendes discusses how wet etching of patterned sapphire substrates for GaN LED manufacturing can present cost savings over dry etching.

30 November 2011

Patterned sapphire for nitride enhancements
In the past few years, patterned sapphire substrates have been used to improve performance of nitride semiconductor light-emitting devices.

30 November 2011

First Chinese Ka-band nitride semiconductor MMIC
Researchers look to higher frequency of ~30GHz for microwave device construction.

30 November 2011

Passivated AlInN/GaN HEMT pushes past 200GHz cut-offs
Switzerland-based research characterizes 30nm-gate-length high-electron-mobility transistor with cut-off frequency of 205GHz.

Features Archive
RSS feeds Recruitment
8 November 2011

HVPE Process Engineer/Manager
IQE, Bath

 
Vacancies

Aixtron advert

III/V Reclaim advert

AXT advert

Advert

WEP advert

LayTec advert

Evatec advert

Logitech Advert

Content on this page requires a newer version of Adobe Flash Player.

Get Adobe Flash player

CrystAL-N - Substrates for epitaxy