, CS Clean Solutions opens modernized refill facility for waste gas treatment columns

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31 January 2018

CS Clean Solutions opens modernized refill facility for waste gas treatment columns

© Semiconductor Today Magazine / Juno PublishiPicture: Disco’s DAL7440 KABRA laser saw.

After completing a 12-month trial phase, CS Clean Solutions AG has opened a new, modernized facility for the refurbishment and service of waste gas treatment columns at its headquarters in Ismaning (near Munich), Germany.

Unused process gases and hazardous by-products from plasma etch, chemical vapor deposition (CVD) and similar semiconductor processes must be removed efficiently and safely from exhaust lines to ensure safety of personnel and compliance with regulatory emission standards. For over 30 years, users of the CLEANSORB range of dry scrubber products in Germany, Austria and Switzerland have benefited from a comprehensive maintenance package comprising a unique take-back and disposal service for the spent absorber material. Similar customer support is available in other countries through CS Clean Solutions’ network of local service centers.

The firm says that expansion of the service centre in Munich was needed to increase throughput and keep pace with the steady growth in semiconductor research and processing in recent years, particularly in the III-V sector. The modernized facility has been re-built from scratch in a dedicated building equipped to the highest standards of operator safety and materials handling, the firm adds.

The CLEANSORB waste gas abatement system removes hazardous process gases by chemical conversion to stable solids at ambient temperature (chemisorption). No external heating, waste water or other facilities are required for operation. The CLEANSORB system is hence fully passive and is permanently on standby, even in the event of a power- or other facilities failure.

Tags: Abatement systems

Visit: www.csclean.com

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