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1 July 2014

Avantor highlighting new cleaning chemistries at SEMICON West

In booth #1520 at the SEMICON West 2014 trade show in San Francisco (8-10 July), Avantor Performance Materials of Center Valley, PA, USA is highlighting advancements in electronics process chemistries, including two new products for photoresist and post-etch residue removal.

Avantor’s electronic chemicals and materials are sold under the company’s J.T.Baker brand and are used in front end of line (FEOL), back end of line (BEOL) and far BEOL surface treatment, including selective etch, post-etch residue removal, photoresist stripping and other manufacturing processes.

The new products extend Avantor’s J.T.Baker CLκ and ALEG product lines to further serve the emerging needs of semiconductor, LED and MEMS manufacturing:

  • J.T.Baker ALEG-368 NMP-free organic film stripper and residue remover for lines, via and bond pad cleaning is developed for technologies containing aluminium interconnects. The ALEG-368 formulation removes ash residue, sidewall polymers, and bulk photoresist, and is NMP-free in response to environmental and regulatory concerns. The material is proven for LED applications, supports the integration of environmental, health and safety (EH&S) roadmaps, and allows for process optimization and cost reduction programs.
  • J.T.Baker CLκ-228 photoresist stripper and post-etch residue remover for advanced copper technologies. Proven for 1x nm technology nodes, CLκ-228 residue remover enables advanced material integration in BEOL through its ability to remove fluorocarbon-based etch residues. A second product feature is efficient photoresist removal, providing fast throughput for any photoresist re-work needs in multiple patterning processes. CLκ-228 residue remover is compatible with porous low-κ dielectrics, including etch-damaged low-κ, enabling CD retention. Processed and filtered to 12nm, it yields very low liquid particle counts (LPC). CLκ-228 is compatible with copper, tungsten, and titanium nitride.

“The additions to our CLκ and ALEG product families are a direct result of productive collaborations with our customers,” says Gary Dailey, VP of global marketing for Avantor’s Electronic Materials business. “Customers choose to collaborate with us because of our expertise in advanced cleaning chemistries, our world-class applications centers, and the J.T.Baker brand’s history of performance and reliability,” he reckons.

Also at SEMICON West, Avantor will showcase its technical capabilities and resources to help semiconductor tool builders and fab operators meet their process improvement goals more quickly and speed up ramp time to the next node.

Tags:  Photoresist removal  

Visit: www.semiconwest.org

Visit: www.avantormaterials.com/Electronic-Materials

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