Temescal

Semigas

CLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIACLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIA

Join our LinkedIn group!

Follow ST on Twitter

IQE

4 October 2013

University of Nottingham buys GENxplor R&D MBE systems for optoelectronic research

Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that the UK’s University of Nottingham has purchased two GENxplor R&D molecular beam epitaxy (MBE) systems for its School of Physics and Astronomy, adding to its installed base of Veeco MBE reactors. The new systems will enable the growth of large-area layers of graphene and boron nitride for electronic and optoelectronic applications.

“Compared to other technologies, MBE better enables the high-temperature and high uniformity deposition required to meet our stringent research demands,” says Dr Sergei Novikov, principal research fellow in the Faculty of Science at the University of Nottingham. “The GENxplor’s high-temperature substrate heater, open architecture and multi-system integration will allow us to grow materials in novel ways,” he adds. “It is our goal to develop electronic and optoelectronic devices, such as diodes and transistors, with improved performance by incorporating graphene and boron nitride materials.”

Graphene is a single-molecule-thick sheet of carbon atoms. High-quality graphene is very strong, light, nearly transparent, and an excellent conductor of heat and electricity. Boron nitride has an atomically smooth surface that is comparatively free of dangling bonds and charge traps.

“Nottingham’s purchase supports our belief that the GENxplor – the industry’s first fully integrated MBE system designed to deposit high-quality epitaxial layers on substrates up to 3” in diameter – is a revolutionary approach for the research community,” says Jim Northup, VP, general manager of Veeco’s MBE Operations.

The GENxplor’s efficient, single-frame design integrates Veeco’s proven vertical chamber technology, with an easy-to-use transfer system and on-board electronics, making it up to 40% smaller than other MBE systems, it is reckoned, saving lab space. Its open-architecture design also improves ease-of-use by providing convenient access to effusion cells and electron-beam sources, improving serviceability compared to other MBE systems, adds Veeco.

See related items:

Veeco launches GENxplor MBE system for compound semiconductor R&D

Tags: Veeco MBE

Visit: www.veeco.com/genxplor

Visit: www.nottingham.ac.uk/physics

Share/Save/Bookmark
See Latest IssueRSS Feed

AXT