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15 August 2013

Oxford Instruments and Cornell University co-host seminar

UK-based etch, deposition and growth system maker Oxford Instruments is co-hosting a seminar entitled ‘Nanoscale Plasma Processing’ with Cornell University (20 – 21 August).

The event will feature talks by invited guest speakers, including Professor Peter Ashburn, Southampton University, UK, who will speak on ‘Application of plasma processing to nanowire biosensors for the diagnosis of respiratory disease’, and Prof Axel Scherer, Caltech, CA, whose talk is entitled ‘3D etching of Silicon Devices at Scales below 10nm’. 

Speakers from Cornell, and process and applications experts from Oxford Instruments Plasma Technology will speak on topics including: Atomic Layer Deposition (ALD), Deep Silicon Etch, Compound Semiconductor etching, HBr silicon etching, Dielectric etching at the nanoscale, polymer etching and other topics during the two day programme.

Prof. Peter Ashburn from Southampton University, UK said, “We hosted a similar event with Oxford Instruments at Southampton University and I am delighted to be involved again, this time at the prestigious Cornell University. Our event in the UK was a great success with high attendance, and the content was excellent with extremely informative talks from a diverse range of speakers. These events are a great means of finding out about new techniques in an informal setting, with plenty of time allowed to discuss specifics in greater detail with the experts!”

Vince Genova from Cornell said, “We are anticipating a large audience at this seminar, and are excited that our guest speakers have accepted our invitation to speak about their work in Plasma Processing. This will be a great opportunity for the Plasma Processing community to come together, to share their experiences, and to learn more from leading international experts in their field.”

The event is free to attend, but booking is required at:

Tags: OIPT Etch


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