9 June 2011

AWR launches Analog Office RFIC PDK for Lfoundry’s 0.15µm RF CMOS process

High-frequency electronic design automation (EDA) software tool provider AWR Corp of El Segundo, CA, USA has announced the availability of a process design kit (PDK) for the LF150 process of LFoundry  GmbH of Landshut, Germany (a foundry for analog, mixed-signal and specialized technologies).

LF150 is a modular 0.15µm RF CMOS process, offering up to six levels of aluminium plus thick metal (2–6µm), optionally a MIM capacitor, a polyimide passivation and I/O voltages of 1.8V, 3.3V and 5.0V. This new PDK targets customers designing RFICs for telecom, automotive, industrial and energy-saving applications.

The Analog Office design kit includes a full set of RF devices, along with a set of standard devices that will expand to include more options as customer demand warrants. The PDK includes fully scalable models covering temperature effects, process corners, and Monte Carlo statistical behavior. Analog Office supports PowerDRC/LVS and Calibre verification flows, both of which are offered in the new PDK. It also includes all electromagnetic (EM) stack-up information pre-configured to perform EM analysis and/or RLCK parasitic extraction from within the Analog Office design environment using AWR’s EM Socket interface.

“We are currently working with one of our European customers in taping out a design using our advanced LF150 process together with AWR’s Analog Office software,” says LFoundry’s chief technology officer Gerhard Spitzlsperger. “This PDK combines LFoundry’s LF150 0.15µm RF CMOS process with AWR’s innovative software and technologies, giving our mutual customers many benefits and advantages to successfully complete designs,” he adds.

“LF150 provides an excellent fit with Analog Office’s customer requirements,” comments AWR product manager Graeme Ritchie. “With RF MOS fTs of up to 90GHz, LF150 is ideal for circuits operating up to 10GHz and beyond, enabling a wide variety of RF applications to be addressed.”

Tags: AWR EDA

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