Company Profile: Aixtron AG

AIXTRON AG delivers a wide range of deposition equipment. The portfolio comprises the three main technology sectors, including:

• Compound Semiconductors
• Organic Semiconductors
• Silicon Semiconductors

Compound Semiconductors

Planetary Reactor®

The laminar flow principle guarantees extremely precise heterojunctions and unequalled control of deposition rates at the monolayer level. The combination of this principle with AIXTRON's unique multiple substrate carrier rotation, known as Gas Foil Rotation® (GFR), ensures excellent deposition homogeneity regarding layer width, composition and doping.

The capacities for the production systems are as follows:

• G3 - 24x2", 49x2", 8x4", 12x4",7x6", 5x10"
• G4 - 42x2", 11x4"

The capacity for the AIX 200 Series R&D small scale production system is as follows:

• 1x2", 3x2", 1x3", 1x4"

Close Coupled Showerhead™

Thomas Swan systems offer a range of vertical MOCVD reactors which are based upon the Close Coupled Showerhead™ (CCS™) concept recognized as a robust route to uniformity and scalability.

The capacities for the production systems are as follows:

• CCS - 6x2", 19x2"
• CRIUS - 30x2"
• TS 3x2"FT - 3x2"

Hot-Wall Reactor Technology

Epigress is known for its Hot-Wall CVD technology for wide band-gap semiconductors such as SiC (Silicon Carbide). Hot-Wall CVD is the technology of choice for synthesizing SiC and electronics structure with exceptional purity and crystal quality.

The capacities for the production systems are as follows:

• VP2400HW - 7x3", 6x4"
• VP508GFR - 1x4", 1x6"

 

Silicon Semiconductors

AIXTRON is offering a full range of cutting-edge deposition technologies for Logic, DRAM, Flash and MIM Applications:

• High Throughput Gate Dielectrics and Cap Layers
• Band-Edge Gate Metals
• High Productivity Films for DRAM
• Films for SONOS and Flash IPD
• Good Quality Films for PCM and FeRAM
• High Quality MIM Films

The technologies Atomic Layer Deposition (ALD), Atomic Vapor Deposition (AVD® ) and Chemical Vapor Deposition (CVD) are used in the Lynx, StrataGem and Tricent® production systems.

• ALD - HfO2, AI2O3, ZrO2 and Nanolaminate
• AVD® - HfO2 , HfSiO, TaN, TiN, Ru
• CVD - WSi, W

 

Organic Semiconductors

AIXTRON’s Organic Vapor Phase Deposition (OVPD) Equipment is the enabling technology for OLED display and organic semiconductor solutions. OVPD is an innovative technology for the thin film deposition of small molecular organic materials. It utilizes the advantages of gas phase deposition, where the materials are transported to the substrate by an inert carrier gas. Customers can choose between R&D Equipment, a Pilot-Production Cluster or Gen2 Equipment.

AIXTRON is fully committed to providing complete customer satisfaction from the initial customized development of each CVD system to the final installation and day-to-day operation of the reactor.

To ensure this, all customers around the world receive the same high quality service and support from AIXTRON’s worldwide offices. Contact form.