, EXALOS orders Veeco’s Propel GaN MOCVD platform for R&D on SLEDs


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29 January 2018

EXALOS orders Veeco’s Propel GaN MOCVD platform for R&D on SLEDs

© Semiconductor Today Magazine / Juno PublishiPicture: Disco’s DAL7440 KABRA laser saw.

Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that EXALOS AG of Schlieren, Switzerland has ordered a Propel gallium nitride (GaN) metal-organic chemical vapor deposition (MOCVD) system (for delivery in third-quarter 2018) for R&D on broadband superluminescent light-emitting diodes (SLEDs).

As a hybrid between LEDs (which emit broadband light from a surface in all directions) and laser diodes (which emit narrowband light from a waveguide with a well-defined laser beam), superluminescent LEDs emit broadband light in a highly directional beam through electrical current injection, and are used in medical and industrial imaging, motion control detectors, navigation, optical sensing and metrology applications.

“With over 400,000 SLED units shipped and strong technical expertise, EXALOS is a proven leader in this space,” comments Peo Hansson Ph.D., senior VP & general manager of Veeco MOCVD Operations. “We are looking forward to working with them closely as the capability of our Propel platform, which serves a wide range of specialized applications, complements their technology and advanced product roadmap,” he adds.

“Veeco’s Propel platform is uniquely qualified to provide the most capable process flexibility with the best results, all while maintaining the lowest cost-of-ownership,” comments EXALOS’ CEO Christian Velez.

The Propel GaN MOCVD system is designed to provide a wide process window and flexible configurations that result in handling a wide range of GaN applications, from power/RF to advanced LEDs, including micro-LEDs, laser diodes, UV-LEDs and SLEDs. The system has the versatility to process 6” and 8” wafers in a single-wafer mode, as well as 2-4” wafers in a mini-batch mode. The Propel reactor is based on Veeco’s TurboDisc technology including IsoFlange and SymmHeat technologies, which provide homogeneous laminar flow and uniform temperature profile across the entire wafer.

At the SPIE Photonics West 2018 tradeshow in San Francisco (29 January – 1 February), Veeco is exhibiting in booth 241 and EXALOS in booth 1941. Veeco is also hosting a technical seminar on 30 January (5pm) at the Marriott Marquis, San Francisco.

Tags: Veeco MOCVD SLED

Visit: http://spie.org/photonics-west.xml

Visit: www.exalos.com

Visit: www.veeco.com

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