26 September 2014

Epistar qualifies Veeco’s new EPIK700 MOCVD system for high-volume LED production

Epitaxial deposition and process equipment maker Veeco Instruments Inc of Plainview, NY, USA says that Taiwan’s largest LED chipmaker Epistar Corp has evaluated and accepted its new TurboDisc EPIK700 gallium nitride (GaN) metal-organic chemical vapor deposition (MOCVD) system for the production of light-emitting diodes.

“It is vital that we continue to push our roadmap to reduce solid-state lighting costs with the most innovative and efficient production solutions available,” comments Epistar’s president Dr MJ Jou. “EPIK’s performance, reliability and production readiness, as well as the support we received from Veeco during the beta-testing phase, fully met our high manufacturing standards,” he adds. “The seamless recipe transfer from our installed base of Veeco K465i and MaxBright systems to the EPIK700 is allowing us to quickly produce production-quality LED devices. In addition, the EPIK700’s cost of ownership advantage will help reduce our cost per wafer, making it a highly attractive platform for our future capacity expansions.”

Based on Veeco’s proven TurboDisc technology, the EPIK700 MOCVD system (launched in early September) enables users to achieve cost per wafer savings of up to 20%, it is reckoned (compared to previous-generation MOCVD systems), through improved wafer uniformity, reduced operating expenses and increased productivity.

“Given Epistar’s position as one of the world’s top LED manufacturers… we look forward to supporting future Epistar expansions in Taiwan and China,” says Jim Jenson, senior vice president, Veeco MOCVD Operations. “Our goal at Veeco is to help customers further accelerate the solid-state lighting market by driving down LED manufacturing costs and increasing productivity,” he adds.

Veeco’s new EPIK700 is reckoned to be the LED industry’s highest-productivity MOCVD system. Available in one-and two-reactor configurations, it features technologies including the new IsoFlange center injection flow and TruHeat wafer coil, providing homogeneous laminar flow and uniform temperature profile across the entire wafer carrier. These innovations produce wavelength uniformity to drive higher yields in a tighter bin. Designed for mass production, due to its large reactor size (accommodating 31x4”, 12x6” and 6x8” wafer carrier sizes), the EPIK700 offers a 2.5x throughput advantage over other systems. Users can easily transfer processes from existing TurboDisc systems to the new EPIK700 MOCVD platform for quick-start production of high quality LEDs, says Veeco. Also, because of the flexibility of the platform, more upgrades, added benefits and future enhancements will continue to differentiate the system, the firm adds.

See related items:

Veeco launches 31x4"/12x6"/6x8"-wafer EPIK700 GaN MOCVD system

Epistar chooses Veeco K465i MOCVD system for GaN-on-Si LED development

Epistar qualifies Veeco’s MaxBright MOCVD system for high-volume production

Epistar places multi-tool order for Veeco K465i GaN MOCVD systems

Tags: Veeco MOCVD GaN HB-LEDs Epistar

Visit: www.veeco.com

Visit: www.epistar.com.tw