Temescal

Semigas

CLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIACLICK HERE: free registration for Semiconductor Today and Semiconductor Today ASIA

Join our LinkedIn group!

Follow ST on Twitter

IQE

10 November 2014

Oxford Instruments plasma etch system for nanofabrication research at Vanderbilt

Vanderbilt University in Tennessee, USA is expanding its research capabilities with the addition of a PlasmaPro 100 Cobra plasma etch system from UK-based etch, deposition and growth system maker Oxford Instruments, to be installed soon in the Vanderbilt Institute of Nanoscale Science and Engineering (VINSE) cleanroom laboratory. Oxford Instruments says that its highly configurable PlasmaPro 100 Cobra system offers ICP dry etching supported by an extensive range of processes, making it suitable for nanofabrication research.

“Until now we have needed to access other regional shared laboratories to undertake the type of processing that will now be facilitated at VINSE using the PlasmaPro 100,” says professor Anthony Hmelo, associate director for operations at VINSE. “We look forward to working together with Oxford Instruments to take advantage of this highly versatile tool,” he adds.

“Our broad range of plasma etch systems offers compact ICP and RIE tools through to multi-wafer and cluster tools,” notes Dr David Haynes, sales & marketing director at Oxford Instruments Plasma Technology. “As well as providing systems for production, our systems are used globally for fundamental research and development, utilizing many new and advanced techniques,” he adds

Tags: OIPT Etch

Visit: www.vanderbilt.edu/vinse

Visit: www.oxford-instruments.com/plasma

Share/Save/Bookmark
See Latest IssueRSS Feed

AXT