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3 December 2014

Nanometrics launches NanoSpec II film metrology system for advanced material characterization

In booth 4168, Hall 4, at SEMICON Japan 2014 in Tokyo (3-5 December), Nanometrics Inc of Milpitas, CA, USA (a supplier of process control metrology and inspection systems) is launching the NanoSpec II standalone metrology system, the latest model in its NanoSpec line of film metrology systems.

With a streamlined design based on the proven NanoSpec tabletop architecture, the NanoSpec II is a fully automated non-contact optical metrology system for advanced material characterization on substrates up to 200mm. For films analysis, it enables process control metrology and characterization on full-stack, multi-layer films and optical constant variation monitoring. New system hardware and software enhancements make the NanoSpec II the industry’s most powerful and cost-effective film metrology system in its class, it is claimed, suitable for industrial and research environments.

“Our latest NanoSpec II standalone and tabletop systems continue to leverage our broad field applications experience across all types of thin film applications,” says David Doyle, VP of the Materials Characterization Group. “The NanoSpec II enables production and R&D customers to tackle their most advanced thin-film metrology applications, all at a lower cost of ownership,” he adds. For owners interested in upgrading their legacy tools, the NanoSpec II can convert and upgrade existing measurement recipes.

Tags: Nanometrics Metrology

Visit: www.nanometrics.com

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