27 March 2012

Aixtron shipping CCS MOCVD reactor to NTT Photonics for InGaAsP laser research

Deposition equipment maker Aixtron SE of Herzogenrath, Germany says that in first-quarter 2012 it is delivering a CCS reactor metal-organic chemical vapor deposition (MOCVD) system to existing customer NTT Photonics of Japan for indium gallium arsenide phosphide (InGaAsP) quaternary diode laser research.

Ordered in second-quarter 2011, the reactor is being installed by a local Aixtron service support team at the NTT Photonics Device Laboratory in Atsugi, Kanagawa Prefecture, Japan.

The new reactor for NTT Photonics is being supplied with several special features, including an EpiCurveTT, ARGUS, Gap Adjustment and Epison 4 in-line gas concentration monitor.

For the NTT Photonics application, another key selection criterion was the Group V efficiency of the CCS reactor, which directly translates into significantly lower operating costs, says Aixtron.

Aixtron says that, able to deliver even the most challenging MOCVD applications, the CCS reactor has very good process flexibility due to the Showerhead concept and uniform flow distribution. Combined with gap adjustment and ARGUS in-situ monitoring for temperature mapping of the entire susceptor, it suits research and development of high-end devices such as InGaAsP quaternary diode lasers, says the firm.

NTT Photonics Laboratories has a long history of expertise in R&D on photonic device technology to support next-generation innovation in telecoms. This involves photonics devices, electronic components, modules and materials with the goal of further contributing to progress in telecoms business through developing new technologies such as diode lasers and commercializing the technology.

See: Aixtron Company Profile

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