6 December 2010
France’s INL orders Riber MBE reactor research system
Riber S.A. of Bezons, France, which manufactures molecular beam epitaxy (MBE) systems as well as evaporation sources and effusion cells, has sold a Compact 21 research system to the Lyon Institute of Nanotechnology (Institut des Nanotechnologies de Lyon, INL).
The new system will supplement existing Riber MBE systems at INL and contribute to expanding the its research capabilities for developing micro- and optoelectronic components, specifically the use of silicon as a ‘universal’ substrate. The project is being financed with funds from a State-Region planning contract.
INL is a mixed research unit, overseen by the French national center for scientific research (CNRS), Ecole Centrale de Lyon, INSA de Lyon and Université Lyon 1. Its mission is to develop research, from materials to systems, paving the way for the emergence of groundbreaking technical fields. Applications cover the main economic sectors, from the semiconductor, microelectronic and photonic industries to telecoms, energy, health, biology, industrial control, defense and the environment.
Riber says that the Compact 21 system sold to INL offers high modularity and flexibility, making it possible to deposit materials with both low and high evaporation temperatures simultaneously (which is particularly suited to growing crystalline oxides on silicon). Drawing on Riber’s technical experience and INL’s oxide growth expertise, the reactor is being integrated into the other Riber systems at INL, which are devoted to growing III-V semiconductor-based nanostructures.
Riber says that, in addition to confirming the commercial success of the Compact 21 range (the world’s best-selling MBE research system), the new order from a leading semiconductor research laboratory highlights Riber’s expertise in nanotechnologies.